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Karen Maex

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Materials, technology and reliability for advanced interconnects and low-k dielectrics
Materials, technology and reliability for advanced interconnects and low-k dielectrics: symposium held April 23-27, 2000, San Fransico, California, U.S.A.
Properties of Metal Silicides (E M I S DATAREVIEWS SERIES)
Dielectric Films for Advanced Microelectronics
Dielectric Films for Advanced Microelectronics
Dielectric Films for Advanced Microelectronics
Silicide Thin Films: Volume 402: Fabrication, Properties and Applications (MRS Proceedings)
Stress-Induced Phenomena in Metallization Eighth International Workshop on Stress-Induced Phenomena in Metallization
Materials Synthesis and Processing using Ion Beams: Volume 316
Good Practices / Best Practices: A Manifesto for Academic Design Education and Research on Creative Practice