Author Description

This dissertation, "Block Copolymer Thin Films for Nanometer Pattern Generation and Nanostructure Synthesis" by Hai, Wang,, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled BLOCK COPOLYMER THIN FILMS FOR NANOMETER PATTERN GENERATION AND NANOSTRUCTURE SYNTHESIS submitted by HAI WANG for the Degree of Doctor of Philosophy at The University of Hong Kong in August 2006 Block copolymers show great potential in nanofabrication, therefore, studies of self assembly in block copolymers and their application for nanostructure synthesis are of considerable interest. The self assembly of asymmetric di- block copolymer poly(styrene ethylene oxide) and poly(styrene-block-methyl methacrylate)thin...lmsisstudiedinthisthesisandtheapplicationofpoly(styrene ethyleneoxide) as astructuredirectingagent inthe synthesis of mesoporous ti- tania structure is also investigated. Firstly, factors aecting the self assembly were systemically examined for thin...lms of two asymmetric diblock copolymers: poly(styrene-block-methyl methacrylate)(P(S-b-MMA))andpoly(styreneethyleneoxide)(P(S-b-EO)).ItwasfoundthatthemorphologyofP(S-b-MMA)isstronglythicknessdependent. Five representative morphologies are identi...ed. Contrary to generally-accepted concept, themorphologywithperpendicularPMMAcylindersinPSmatrixwas obtained for the...lm thickness range of 48 nm to 63 nm on SiOx/Si substrates withoutapplyingexternalelectric...eldoranysurfacetreatment(hydrogenpas- sivation, functionalizedrandomcopolymers, orself-assembledmonolayers). The...lms with uniform ordering at large scale can be obtained after annealing by choo