Physics and Technology of High-k Gate Dielectrics II Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003
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Author Description
"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues... and was held during [the] 204th Meeting [of the Electrochemical Society]..."--P. v.
Page Count:
490
Publication Date:
2004-01-01
ISBN-10:
1566774055
ISBN-13:
9781566774055
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