Author Description

This book, first published in 1999, presents the technical information on ferroelectric thin films from an international array of academia, government organizations and industry. The results in DRAM and FERAM devices, as well as enhancements in materials performance for these applications are reported. Advances in integration issues are also discussed, including electrode technologies, annealing procedures, and fabrication methods. The development of ferroelectric thin films for piezoelectric, pyroelectric and optical applications is reviewed. And improved film fabrication procedures, including chemical vapor deposition and chemical solution deposition, are featured. Topics include: BST and DRAM; integration and electrodes; bilayered ferroelectrics; Pb-based ferroelectrics; fundamental material properties and superlattices; ferroelectric gate materials and devices; piezoelectric, electrostrictive, pyroelectric and giant magnetoresistive materials; and ferroelectrics for microwave and optical applications.